Purpose:
The equipment is designed to remove photoresist residues, activate the surface, and also allows for the dry etching of certain substances, such as graphene and nanotubes.
The main directions of research conducted using the equipment:
- Lithographic processes.
- Physics of van der Waals heterostructures (work with thin scales).
Specifications:
| Camera volume | 1 l. |
| Frequency | 40 kHz. |
| Power | 300 watts. |
| Vacuum | 10-1 — 3*100 Torr. |
| Oxygen Generator | 6 l/hour |
| Gas | with flow controllers |
