Cluster equipment for plasma chemical etching and deposition

The equipment is designed to remove photoresist residues, activate the surface, and also allows for the dry etching of certain substances, such as graphene and nanotubes.

The main directions of research conducted using the equipment:

  • Lithographic processes.
  • Physics of van der Waals heterostructures (work with thin scales).


Camera volume1 l.
Frequency40 kHz.
Power300 watts.
Vacuum10-1 — 3*100 Torr.
Oxygen Generator6 l/hour
Gaswith flow controllers