Mask-free optical (UV) lithography (Heidelberg)

Full name:
Heidelberg mPG 101 laser lithography equipment.

Specifications:

Wavelength of the laser LED375 nm.
LED Power70 watts.
Minimum size of structures0.9 microns (2.5 microns), depending on the writing lens
Alignment accuracyno worse than 200 nm.
Maximum illumination area125×125 mm2