Equipment-CVD-En

Components:

  • tubular furnace KJ-T-1200;
  • digital gas flow monitoring station.

Purpose:
Production of various samples.

Description:
The equipment is a tubular furnace with a hole diameter of 60 mm with a controller for temperatures up to 1200 C, a vacuum pumping system and regulation of gas supply and a digital control station. It is fully functional and actively used.
The installation is configurable, in particular it is used for:

  • annealing of samples of layered materials in vacuum;
  • application of a parylene coating by CVD.

The gas flow control unit is used in a plasma chemical etching unit.

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